Products

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

KV-300

Tabletop film thickness tool with vision for measuring transparent films of thickness up to 500 µm.

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

KV-300a

Fully automated version of KV-300 available with many options.

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

KF-10

Tabletop film thickness tool for measuring transparent films of thickness up to 160 µm.

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

N-2

Replacement optics, PC, and software for Nanometrics microscope systems (180/181/210)

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

L-2

Manual tabletop film thickness tool for measuring transparent films of thickness up to 160 µm.

silicon wafer

Inline

L-2 product is also available in component form to allow easy integration or clustering with other tools. Very compact design enables in-process metrology.

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

Si-71

Tabletop metrology tool for measuring Si, GaAs, resist, … of thickness range 20 µm to 500+ µm (Si) or > 1 mm of resist.  Ideal for process control of backthinned Si.