KV-300

film thickness, metrology, measurement, instrument, thin film, thick film, wafer thinning, backgrind, refractive index, ellipsometry, interferometry, reflectivity, spectrometer, oxide, photoresist, resist, uniformity, polymer, nitride, oxynitride, polyimide, BCB, SU-8, spin-on, low-k, a-silcon, polysilicon, amorphous silicon, dielectric, silicon, silicide, GaAs, mapping, wafer, semiconductor, plating, electroplating, advanced packaging, epitaxy, MEMS, magnetic disk, micromachining, flat panel display

Compact footprint with high reliability R – Θ stage
Generate thickness contour map in less than one minute
Internal reference – calibration standard to maintain accuracy
Produces no stray white light
Optical design eliminates need for focusing
Simple maintenance: semiannual lamp change done in minutes

Configurations:

Different thickness ranges
Monochrome camera system
Vacuum chuck
Manual positioning (KV-300m)
SEMI S2 compliant (option)